Extended Defects in Germanium (eBook)

Fundamental and Technological Aspects
Artikelnummer: 978-3-540-85614-6
Einband: PDF
Verfügbarkeit: Download, sofort verfügbar (Link per E-Mail)
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The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control.


The aim is to give an overview of the physics of extended defects in Germanium, i.e. dislocations (line defects), grain boundaries, stacking faults, twins and {311} defects (two-dimensional defects) and precipitates, bubbles, etc. The first part covers fundamentals, describing the crystallographic structure and other physical and electrical properties, mainly of dislocations. Since dislocations are essential for the plastic deformation of Germanium, methods for analysis and imaging of dislocations and to evaluate their structure are described. Attention is given to the electrical and optical properties, which are important for devices made in dislocated Ge. The second part treats the creation of extended defects during wafer and device processing. Issues are addressed such as defect formation during ion implantation, necessary to create junctions, which are an essential part in every device type. Extended defects are also created during the deposition of thin or thick epitaxial layers on other substrates, which are important for optoelectronic and photovoltaic applications. In brief, the book is intended to provide a fundamental understanding of the extended-defect formation during Ge materials and device processing, providing ways to distinguish harmful from less detrimental defects and should point out ways for defect engineering and control.


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VerlagSpringer
EinbandPDF
Erscheinungsjahr2008
Seitenangabe300 S.
AusgabekennzeichenEnglisch
Masse11'344 KB
PlattformPDF
ReiheChemistry and Material Science
AutorClaeys, Cor / Simoen, Eddy

Alle Bände der Reihe "Chemistry and Material Science (R0)"

Über den Autor Cor Claeys

Cor Claeys is a Professor at the KU Leuven (Belgium) since 1990. He was at imec, Leuven, Belgium from 1984 till 2016. His main interests are silicon technology, device physics, low-frequency noise phenomena, radiation effects, defect engineering and material characterization. He has co-edited a book on "Low Temperature Electronics" and "Germanium-Based Technologies: From Materials to Devices" and co-authored monographs on "Radiation Effects in Advanced Semiconductor Materials and Devices," "Fundamental and Technological Aspects of Extended Defects in Germanium" and "Random Telegraph Signals in Semiconductor Devices." He (co)authored 15 book chapters, over 1100 conference presentations and more than 1300 technical papers. He is editor/co-editor of 60 Conference Proceedings. Prof. Claeys is a Fellow of the Electrochemical Society and of the IEEE. He was Founder of the IEEE Electron Devices Benelux Chapter, Chair of the IEEE Benelux Section, elected Board of Governors  Member of the Electron Devices Society and the EDS Vice President for Chapters and Regions. He was EDS President in 2008-2009 and Division Director on the IEEE Board of Directors in 2012-2013. He is a recipient of the IEEE Third Millennium Medal and received the IEEE EDS Distinguished Service Award.Within the Electrochemical Society, he was the Chair of the Electronics & Photonics Division from 2001 to 2003. In 2004, he received the Electronics and Photonics Division Award. In 2016 he received the Semi China Special Recognition Award  for outstanding involvement in the China Semiconductor Technology International Conference (CSTIC). Eddy Simoen obtained his Bachelor's (1976-1978) and Master's degrees in Physics Engineering (1978-1980), as well as his Ph.D. in Engineering (1985), from Ghent University (Belgium). He is currently a Specialist at imec (Leuven, Belgium), involved in the study of defect and strainengineering in high-mobility and epitaxial substrates and defect studies in germanium and III-V compounds (AlN; GaN, InP, etc). Another current focus point is the study of 1-transistor memories based on bulk FinFET and Ultra-thin Buried Oxide (UTBOX) Silicon-on-Insulator (SOI), using low-frequency noise. In 2013, he was appointed a part-time Professor at Ghent University. He is a member of the IEEE and ECS and became an ECS Fellow in 2016. In these fields, he has (co-) authored over 1500 Journal and Conference papers, 12 book chapters and a monograph on Radiation Effects in Advanced Semiconductor Devices and Materials (Springer, 2002). He was also a co-editor of the book on Germanium-based Technologies - from Materials to Devices (Elsevier March 2007; Chinese translation 2010). Another book on the "Fundamental and Technological Aspects of Extended Defects in Germanium" was published by Springer in January 2009. In 2016 he published "Random Telegraph Signals in Semiconductor Devices" with IOP. He is also a co-inventor of two patents.

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