Atomic Processes in Basic and Applied Physics

Artikelnummer: 978-3-642-44210-0
Einband: Kartonierter Einband (Kt)
Verfügbarkeit: Lieferbar in ca. 20-45 Arbeitstagen
CHF 189.00
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The book is a comprehensive edition which considers the interactions of atoms, ions and molecules with charged particles, photons and laser fields and reflects the present understanding of atomic processes such as electron capture, target and projectile ionisation, photoabsorption and others occurring in most of laboratory and astrophysical plasma sources including many-photon and many-electron processes. The material consists of selected papers written by leading scientists in various fields.
EUDR exemption - product or manufacturing materials placed on the market prior to 31.12.2025.
The book is a comprehensive edition which considers the interactions of atoms, ions and molecules with charged particles, photons and laser fields and reflects the present understanding of atomic processes such as electron capture, target and projectile ionisation, photoabsorption and others occurring in most of laboratory and astrophysical plasma sources including many-photon and many-electron processes. The material consists of selected papers written by leading scientists in various fields.
EUDR exemption - product or manufacturing materials placed on the market prior to 31.12.2025.
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VerlagSpringer EN
EinbandKartonierter Einband (Kt)
Erscheinungsjahr2014
Seitenangabe498 S.
AusgabekennzeichenEnglisch
AbbildungenXXII, 498 p.
MasseH23.5 cm x B15.5 cm 789 g
CoverlagSpringer (Imprint/Brand)
ReiheSpringer Series on Atomic, Optical, and Plasma Physics
AutorShevelko, Viacheslav (Hrsg.) / Tawara, Hiro (Hrsg.)

Alle Bände der Reihe "Springer Series on Atomic, Optical, and Plasma Physics"

Weitere Titel von Viacheslav (Hrsg.) Shevelko

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